Agilent, RMSHY-4, Big universal trap, Hydrogen, 1/4 in, 300 psig

Big universal trap, Hydrogen, 1/4 in, 300 psig. Large capacity Carrier Gas or Triple Filter. Delivers faster stabilization times for increased GC productivity, removes oxygen, moisture, and hydrocarbons from the carrier gas for MS applications, and provides ultimate GC column protection. Uses 1/4" brass fittings and intended to purify Hydrogen Gas.

Specifications:
Body Material: Brass
Diameter: 2.3 in
Fitting Size: 1/4 in
Gas Filter Type: Combination (Universal)
Includes Indicator: No
Length: 17.5 in
Maximum Pressure: 300 psig
Trap Capacity: 750 cc
UNSPSC Code: 41115700

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Designed for robust laboratory gas management, this large-capacity universal trap is engineered to remove hydrogen efficiently from analytical gas streams. With a 1/4-inch connection and a maximum pressure rating of 300 psig, it provides a secure and adaptable solution for critical purification requirements in both research and industrial environments. The trap safely adsorbs hydrogen to protect downstream chromatographic systems, detectors, or other sensitive analytical instrumentation from contamination and unwanted chemical reactions.

This model is ideal for laboratories using gas chromatography, mass spectrometry, or any system where hydrogen impurities may compromise data quality or instrument performance. Its universal compatibility makes it suitable for integration into existing gas lines, offering straightforward installation with a broad range of instruments that accept 1/4-inch fittings. The trap’s large holding capacity ensures extended operational life, reducing maintenance frequency and downtime.

Frequently used in applications involving ultra-high purity gases, petrochemical analysis, and environmental testing, this trap enhances analytical reliability by providing a contaminant-free gas stream. It can be paired effectively with other Agilent gas purification products or integrated into custom gas delivery systems for comprehensive protection and consistent results in demanding research and industrial workflows.